Method for significant reduction of dislocations for a very high A1 composition A1GaN layer

Method for significant reduction of dislocations for a very high A1 composition A1GaN layer

Patent ID: US-7776636-B2
Published: August 2010
Category: Manufacturing & Industrial

Abstract

A method for reducing dislocation density between an AlGaN layer and a sapphire substrate involving the step of forming a self-organizing porous AlN layer of non-coalescing column-like islands with flat tops on the substrate.

Patent Details

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